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Ishizawa Keana Nadeshiko Goodbye Pore Makeup Base
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Ishizawa Keana Nadeshiko Goodbye Pore Makeup Base

Ishizawa Keana Nadeshiko Goodbye Pore Makeup Base

Soft & light makeup base covers the bumpy skin. Just spreads lightly where you are concerned about open & black pores such as cheeks and nose, it will make the skin smooth and poreless. This is a makeup base that is covering the pores with a light application that doesn't need techniques.

Ingredients:

Dimethicone, Cyclopentasiloxane, Dimethicone/Vinyl Dimethicone Crosspolymer, Acrylates Crosspolymer, Vinyl Dimethicone/Methicone Silsesquioxane Crosspolymer, Trimethylsiloxysilicate, Isononyl Isononanoate, Dimethylsilylated Silica, Silk, Sericin, Hydrolyzed Silk, Hydrolyzed Collagen, Soluble Collagen, Sodium Hyaluronate, Soluble Collagen Crosspolymer, Triethoxycaprylylsilane, Water, Butylene Glycol, Hydrogen Dimethicone, Methicone, Phenoxyethanol, Titanium Dioxide, Talc, Iron Oxides, Aluminum Hydroxide


$6.85

Original: $22.84

-70%
Ishizawa Keana Nadeshiko Goodbye Pore Makeup Base—

$22.84

$6.85

Ishizawa Keana Nadeshiko Goodbye Pore Makeup Base

Soft & light makeup base covers the bumpy skin. Just spreads lightly where you are concerned about open & black pores such as cheeks and nose, it will make the skin smooth and poreless. This is a makeup base that is covering the pores with a light application that doesn't need techniques.

Ingredients:

Dimethicone, Cyclopentasiloxane, Dimethicone/Vinyl Dimethicone Crosspolymer, Acrylates Crosspolymer, Vinyl Dimethicone/Methicone Silsesquioxane Crosspolymer, Trimethylsiloxysilicate, Isononyl Isononanoate, Dimethylsilylated Silica, Silk, Sericin, Hydrolyzed Silk, Hydrolyzed Collagen, Soluble Collagen, Sodium Hyaluronate, Soluble Collagen Crosspolymer, Triethoxycaprylylsilane, Water, Butylene Glycol, Hydrogen Dimethicone, Methicone, Phenoxyethanol, Titanium Dioxide, Talc, Iron Oxides, Aluminum Hydroxide


Product Information

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Description

Soft & light makeup base covers the bumpy skin. Just spreads lightly where you are concerned about open & black pores such as cheeks and nose, it will make the skin smooth and poreless. This is a makeup base that is covering the pores with a light application that doesn't need techniques.

Ingredients:

Dimethicone, Cyclopentasiloxane, Dimethicone/Vinyl Dimethicone Crosspolymer, Acrylates Crosspolymer, Vinyl Dimethicone/Methicone Silsesquioxane Crosspolymer, Trimethylsiloxysilicate, Isononyl Isononanoate, Dimethylsilylated Silica, Silk, Sericin, Hydrolyzed Silk, Hydrolyzed Collagen, Soluble Collagen, Sodium Hyaluronate, Soluble Collagen Crosspolymer, Triethoxycaprylylsilane, Water, Butylene Glycol, Hydrogen Dimethicone, Methicone, Phenoxyethanol, Titanium Dioxide, Talc, Iron Oxides, Aluminum Hydroxide


Ishizawa Keana Nadeshiko Goodbye Pore Makeup Base | W cosmetics